Process for the preparation of 3-halo-and pseudohalo-alkylsilane

Organic compounds -- part of the class 532-570 series – Organic compounds – Silicon containing

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

556414, 556415, 552 4, C07F 708, C07F 710

Patent

active

056167628

ABSTRACT:
3-Halo- and pseudohalo-alkylsilane esters are prepared by reacting an allyl X compound or a compound containing an allyl X structure with a hydridosilane ester in the presence of an iridium catalyst prepared under specific conditions and/or the reaction medium containing a 0.01-100 mol % excess of the allyl X compound or compound containing the allyl X unit relative to the amount of hydridosilane ester reactant.

REFERENCES:
patent: 3296291 (1967-01-01), Chalk et al.
patent: 3564266 (1971-02-01), Klotz, Jr.
patent: 4658050 (1987-04-01), Quirk
patent: 5523436 (1996-06-01), Dauth et al.
Tanaka M. et al, "Ruthenium Complex-Catalyzed Hydrosilylation of Allyl Chloride with Trimethoxysilane", Chemical Abstracts, vol. 119, No. 17, Oct. 25, 1993, p. 802.
Kopylova, L.I. et al, "Iridium Complexes in the Hydrosilylation of Unsaturated Compounds", Russian Journal of General Chemistry, vol. 63, No. 10, Oct. 1993, pp. 2257-2266.
Belyakova Z. V. et al, "Patterns of Behavior in the Reactions of Hydride Silanes with Allyl Chloride", Zhurnal Obshchei Khimii, vol. 44, No. 11, Nov. 1974, pp. 2439-2442.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process for the preparation of 3-halo-and pseudohalo-alkylsilane does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for the preparation of 3-halo-and pseudohalo-alkylsilane, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for the preparation of 3-halo-and pseudohalo-alkylsilane will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-540429

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.