Phase shift mask and manufacturing method thereof

Details Phase shift mask and manufacturing method thereof Phase shift mask and manufacturing method thereof

1994-10-31

1996-11-19

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430311, 430312, 430313, G03F 900

Patent

active

055761224

ABSTRACT:
A phase shift mask and a manufacturing method thereof are disclosed. To overcome problem that a photoresist film at an area unexposed to the light is removed by a certain thickness when the conventional half-tone phase shift mask is used for the formation of a photoresist film pattern, the phase shift mask comprises: a lower non-transmissionable film and a phase shift film laminated on a predetermined area unexposed to the light on a transparent substrate, the lower non-transmissionable film having a predetermined light-transmission degree; and an upper non-transmissionable film formed on the phase shift film.

REFERENCES:
patent: 5130263 (1992-07-01), Possin et al.
patent: 5380609 (1995-01-01), Fujita et al.

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