Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate
Patent
1994-11-08
1996-11-19
King, Roy V.
Coating processes
Direct application of electrical, magnetic, wave, or...
Pretreatment of substrate or post-treatment of coated substrate
427533, 427535, 4272551, 4272552, 4272557, C23C 1656, H05H 100
Patent
active
055760716
ABSTRACT:
A chemical vapor deposition method of providing a layer of material atop a semiconductor wafer using an organic precursor includes, a) injecting an organic precursor and a carrier gas into a reactor having a wafer positioned therein, and maintaining reactor conditions which are effective to deposit a first layer onto the wafer which incorporates carbon from the organic precursor; b) after depositing the first layer, ceasing to inject the organic precursor into the reactor and first injecting hydrogen gas into the reactor and generating a first reactive hydrogen plasma within the reactor against the first layer, the hydrogen effectively diffusing into the first layer and reacting with carbon therein to produce gaseous products which diffuse outwardly of the first layer and are expelled from the reactor; an additional reactive component can be provided; c) after the first reactive hydrogen plasma treatment, injecting the organic precursor and carrier gas to within the reactor, and maintaining the reactor at conditions which are effective to deposit a second layer onto the wafer which incorporates carbon from the organic precursor; and d) after depositing the second layer, ceasing to inject the organic precursor into the reactor and second injecting hydrogen gas into the reactor and generating a second reactive hydrogen plasma within the reactor against the second layer, the hydrogen effectively diffusing into the second layer and reacting with carbon in the second layer to produce gaseous products which diffuse outwardly of the second layer and are expelled from the reactor.
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King Roy V.
Micro)n Technology, Inc.
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