Method of inspecting a mask using an electron beam vector scan s

Details Method of inspecting a mask using an electron beam vector scan s Method of inspecting a mask using an electron beam vector scan s

1982-05-11

1984-10-02

Anderson, Bruce C.

Radiant energy

Calibration or standardization methods

2504911, G01N 2100, G01D 1800, G12B 1300

Patent

active

044750374

ABSTRACT:
An electron beam fabricated mask used in the production of integrated circuits is tested by a method that includes the steps of forming a print of the mask and then inspecting the print by writing the same electron beam pattern or complement thereof on the print and detecting pattern coincidence and non-coincidence with a vector scan system.

REFERENCES:
patent: 3855023 (1974-12-01), Spicer et al.
patent: 3876879 (1975-04-01), McAdams et al.
patent: 4218142 (1980-08-01), Kryger et al.

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