Focused ion beam column

Details Focused ion beam column Focused ion beam column

1988-10-11

1990-05-29

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

Ion or electron beam irradiation

250358, H01J 3708

Patent

active

049298399

ABSTRACT:
A focused ion beam optical column includes asymmetrical three-element electrostatic upper and lower lenses, a velocity filter, an electrostatic blanker, and an electrostatic octopole deflector for maskless ion implantation, resist exposure, repair of x-ray and photo masks, micromachining, and scanning ion microscopy and microanalysis. A constant and relatively high beam energy is maintained through the mass filter and blanker. The column produces a focused beam over a wide range of final beam voltages, with the particular voltage range determined by the dimensions of three components in the column. A large working distance between the main deflector and target is provided to allow for the insertion of imaging and/or charge neutralization optics.

REFERENCES:
patent: 4457803 (1984-07-01), Takigawa
patent: 4641034 (1987-02-01), Okamura et al.
patent: 4757208 (1988-07-01), McKenna et al.

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