Positive photoresist composition

Details Positive photoresist composition Positive photoresist composition

1996-10-25

1998-05-05

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430191, 430193, G03F 7023

Patent

active

057472181

ABSTRACT:
A positive photoresist composition for ultrafine working ensuring high sensitivity, high resolution, improved film thickness dependency and improved exposure margin, which comprises an alkali-soluble resin and a 1,2-naphthoquinonediazide-5-(and/or -4-)sulfonic ester of a polyhydroxy compound of formula (I), the tetraester component thereof accounting for 50% or more of the entire pattern area determined by high-performance liquid chromatography using ultraviolet rays of 254 nm: ##STR1## wherein X represents ##STR2## and the substituents other than X are as defined in the specification.

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patent: 5173389 (1992-12-01), Uenishi et al.
patent: 5340686 (1994-08-01), Sakaguchi et al.
patent: 5407779 (1995-04-01), Uetani et al.
patent: 5554481 (1996-09-01), Kawabe et al.

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