Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Patent
1999-04-20
2000-02-22
Gupta, Yogendra
Cleaning compositions for solid surfaces, auxiliary compositions
Cleaning compositions or processes of preparing
For cleaning a specific substrate or removing a specific...
510403, 510434, 510499, 510476, A61K 7047, C11D 162, C11D 337, C11D 343
Patent
active
060280409
ABSTRACT:
A thickened nail polish remover includes a solvent/water blend containing a major amount of organic solvent and a minor amount of water. The nail polish remover also includes a water-wetted thickener that, when dry, is readily dispersible in water but not readily dispersible in the solvent/water blend. The nail polish remover further includes a long chain amine neutralizing agent. The thickened nail polish remover has a viscosity of from 3,000 centipoise to 90,000 centipoise at 21.degree. C. In one embodiment, the thickened nail polish remover is formulated to be easily rinsable from the nails with water, by selecting a long chain amine neutralizing agent so that the neutralized thickener is compatible both with the solvent/water blend and with the water used to rinse the nails. In the method of preparing the thickened nail polish remover, the thickener is prewetted with the water of the solvent/water blend to form a dispersion of the thickener in the water. The prewetted thickener and water are then mixed with the solvent of the solvent/water blend, and with a long chain amine neutralizing agent, to produce the thickened nail polish remover.
REFERENCES:
patent: 5543085 (1996-08-01), Miner
"Thickening & Suspending with Carbopol Resins", pp. 14, 21, 22, 24-26, and 52 (Apr. 1995).
Hawley's Condensed Chemical Dictionary, p. 318 (1993).
"Thickening and Suspending with Carbopol Resins", B.F. Goodrich Trade Literature, p. 23, Apr. 1995.
Gupta Yogendra
Ingersoll Christine
J. Stephen Scherer, Inc.
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