Polishing pad conditioning surface having integral conditioning

Details Polishing pad conditioning surface having integral conditioning Polishing pad conditioning surface having integral conditioning

1997-12-03

2000-02-22

Powell, William

Etching a substrate: processes

Forming or treating an article whose final configuration has...

156345, 216 88, 438691, 438692, B44C 122

Patent

active

060276592

ABSTRACT:
A pad conditioner having integral conditioning points. The pad conditioner includes a conditioning surface having a first integral conditioning point extending from the conditioning surface. For one embodiment the conditioning surface is formed of diamond and an array of integral conditioning points including the first integral conditioning point extends from the diamond surface.

REFERENCES:
patent: 5216843 (1993-06-01), Breivogel et al.
patent: 5527424 (1996-06-01), Mullins
patent: 5547417 (1996-08-01), Breivogel et al.
patent: 5611943 (1997-03-01), Cadien et al.
patent: 5783488 (1998-07-01), Bothra et al.

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