Photoconductive member having an amorphous silicon layer

Details Photoconductive member having an amorphous silicon layer Photoconductive member having an amorphous silicon layer

1983-03-08

1985-02-26

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Radiation-sensitive composition or product

430 65, 430 84, 430 95, G03G 5082

Patent

active

045018073

ABSTRACT:
A photoconductive member comprising a support for photoconductive member and an amorphous layer exhibiting photoconductivity comprising an amorphous material containing silicon atoms as a matrix is characterized in that said amorphous layer has a first layer region containing, as constituent atoms, oxygen atoms in a distribution which is nonuniform and continuous in the direction of the layer thickness and a second layer region containing, as constituent atoms, the atoms (A) belonging to group III or group V of the periodic table in a distribution which is continuous in the direction of the layer thickness, said second layer existing internally beneath the surface of said amorphous layer.

REFERENCES:
patent: 4361638 (1982-11-01), Higashi et al.
patent: 4414319 (1983-11-01), Shirai et al.

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