Projection exposure apparatus

Details Projection exposure apparatus Projection exposure apparatus

1993-02-05

1994-04-05

Wintercorn, Richard A.

Photocopying

Projection printing and copying cameras

Illumination systems or details

355 53, G03B 2772, G03B 2742

Patent

active

053009720

ABSTRACT:
A projection exposure apparatus includes a light source, a condenser lens for condensing illumination light emanating from the light source onto a mask including a circuit pattern, a projection lens for condensing the illumination light that has passed through the mask onto a surface of a wafer, and a polarizer for converting the illumination light into linearly polarized light so that an inclined surface on the surface of the wafer is illuminated only with p-polarized light. It may also be arranged such that a single polarizer is not fixed in the optical path of the illumination light and a polarizer suited to an exposure process is selected from a plurality of polarizers and used. In that case, a device selectively positions one of a plurality of polarizers in the optical path of the illumination light so that an inclined surface on the surface of the wafer is illuminated only with p-polarized light.

REFERENCES:
patent: 4740079 (1988-04-01), Koizumi et al.
patent: 4864123 (1989-09-01), Mizutani et al.
patent: 4922308 (1990-05-01), Noguchi et al.
patent: 4938598 (1990-07-01), Akiyama et al.
patent: 4952815 (1990-08-01), Nishi
patent: 5004348 (1991-04-01), Magome
patent: 5046847 (1991-09-01), Nakata et al.
patent: 5048967 (1991-09-01), Suzuki et al.
patent: 5070250 (1991-12-01), Komatsu et al.
patent: 5133603 (1992-07-01), Suzuki et al.
patent: 5171999 (1992-12-01), Komatsu et al.

Affiliated with

Also associated with

Rating

Projection exposure apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Projection exposure apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Projection exposure apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-515207