Ultrasonic photoresist process monitor and method

Details Ultrasonic photoresist process monitor and method Ultrasonic photoresist process monitor and method

1997-10-03

2000-02-22

Williams, Hezron

Measuring and testing

Vibration

By mechanical waves

73627, 374119, G01N 2910, G01N 2908

Patent

active

060266880

ABSTRACT:
There is provided a monitor and method for monitoring the condition of a photoresist film on a wafer during baking in which the phase of high frequency ultrasonic pulses reflected from the wafer/photoresist interface provides an indication of the condition of the photoresist film.

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Ballantine, David S., Jr. et al.; "Use of Saw Devices to Monitor Visco-Elastic Properties of Materials", IEEE 1988, pp. 559-562.
Ballantine, D.S. Jr., et al.; "Acoustic Wave Sensors: Theory, Design, and Physico-Chemical Applications", Academic Press, Chapter 4, pp. 154-167.

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