Fluorine plasma oxidation of residual sulfur species

Details Fluorine plasma oxidation of residual sulfur species Fluorine plasma oxidation of residual sulfur species

1983-05-31

1985-02-26

Roy, Upendra

Metal working

Method of mechanical manufacture

Electrical device making

29590, 148187, 156643, 156665, C23F 102

Patent

active

045010617

ABSTRACT:
A method for stripping an organic photoresist layer from a semiconductor device comprises oxidation of the photoresist layer with oxygen plasma and subsequent removal of residual sulfur species using a fluorine-containing plasma.

REFERENCES:
patent: 4057460 (1977-11-01), Saxena et al.
patent: 4233337 (1980-11-01), Friedman et al.
patent: 4267012 (1981-05-01), Pierce et al.
patent: 4357203 (1982-11-01), Zelig
patent: 4357369 (1982-11-01), Kilichowski et al.
patent: 4371408 (1983-02-01), Kurosawa
patent: 4374699 (1983-02-01), Sanders et al.
patent: 4412885 (1983-11-01), Wang et al.
Suzuki et al., Jap. Jr. Appl. Physics., 16 (1977) 1979.

Affiliated with

Also associated with

Rating

Fluorine plasma oxidation of residual sulfur species does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Fluorine plasma oxidation of residual sulfur species, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fluorine plasma oxidation of residual sulfur species will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-510875