Process for depositing titanium nitride film by CVD

Details Process for depositing titanium nitride film by CVD Process for depositing titanium nitride film by CVD

1993-05-04

1994-04-05

King, Roy V.

Coating processes

Coating by vapor, gas, or smoke

4272551, 4271261, 427314, C23C 1600

Patent

active

053003217

ABSTRACT:
A process which is capable of depositing a titanium nitride film of a high quality at a high deposition rate by low temperature chemical vapor deposition is provided. The titanium nitride film is deposited using a gas source comprising a compound of the general formula:

REFERENCES:
patent: 5080927 (1992-01-01), Ikeda et al.
patent: 5178911 (1993-01-01), Gordon et al.
patent: 5194642 (1993-03-01), Winter et al.

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