Exposing device capable of making clear pattern image on photo r

Details Exposing device capable of making clear pattern image on photo r Exposing device capable of making clear pattern image on photo r

1994-01-21

1995-07-11

Wintercorn, Richard A.

Photocopying

Projection printing and copying cameras

Step and repeat

355 55, G03B 2742, G03B 2754

Patent

active

054325870

ABSTRACT:
A reticle (25) is displaceably supported in an optical axis relative to a reticle pattern image (33). When the reticle is displaced, a pattern image (35) has a negative longitudinal spherical aberration. The pattern image is clear on a photo resist layer on a wafer (37) that has a central surface and a side surface which is lower than the central surface. A first transparent parallel-plate may be removably placed between the reticle and the wafer. The first transparent parallel-plate gives a positive longitudinal spherical aberration of the pattern image. A second transparent parallel-plate may be movably placed between the reticle and the wafer. The second transparent parallel-plate gives a negative longitudinal spherical aberration to the pattern image.

REFERENCES:
patent: 4688904 (1987-08-01), Hirose et al.
patent: 4891663 (1990-01-01), Hirose
patent: 4937619 (1990-06-01), Fukuda et al.
patent: 4965630 (1990-10-01), Kato et al.
patent: 4977426 (1990-12-01), Hirose
patent: 5105075 (1992-04-01), Ohta et al.
patent: 5117255 (1992-05-01), Shiraishi et al.
patent: 5311362 (1994-05-01), Matsumoto et al.
Patent Abstracts of Japan, vol. 9, No. 13 (P-328), Jan. 19, 1985.

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