Dose measurement and uniformity monitoring system for ion implan

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

250357, G01N 2300

Patent

active

047513934

ABSTRACT:
Apparatus for determining ion dose and ion dose uniformity of an ion beam scanned over a target plane in response to scanning signals includes a mask assembly for sensing the beam current at several different locations and providing a single beam current signal. The mask assembly includes a mask plate with sensing apertures and an annular Faraday cup aligned with the apertures for sensing beam current. The beam current signal is integrated over time to determine ion dose. A demultiplexer, in response to x and y scan signals, separates the beam current signal into separate signal components from each sensing aperture. Ion dose uniformity is determined by comparing the separate signal components, integrated over time, with an average value of the signal component.

REFERENCES:
patent: 3689766 (1972-09-01), Freeman
patent: 3857090 (1974-12-01), Chick
patent: 4021675 (1977-05-01), Shifrim
patent: 4260897 (1981-04-01), Bakker et al.
patent: 4283631 (1981-08-01), Turner
patent: 4628209 (1986-12-01), Wittkower

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Dose measurement and uniformity monitoring system for ion implan does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Dose measurement and uniformity monitoring system for ion implan, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Dose measurement and uniformity monitoring system for ion implan will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-506468

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.