Positive type photoresist composition

Details Positive type photoresist composition Positive type photoresist composition

1993-02-10

1994-08-23

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430191, 430193, 534557, G03F 7021, G03F 730

Patent

active

053406885

ABSTRACT:
Disclosed is a novel positive type photoresist composition comprising a 1,2-naphthoquinonediazido-5-(and/or -4-)sulfonic ester of a member selected from the group consisting of the polyhydroxy compounds represented by the following formula (I), (II) or (III) and an alkali-soluble resin: ##STR1## wherein the variables of Formula I are defined in the specification; ##STR2## wherein the variables of Formula II are defined in the specification; ##STR3## wherein the variables of Formula III are defined in the specification.

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Introduction to Microlithography, ACS, No. 219, L. P. Thompson, pp. 112-121.

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