Coating apparatus – Gas or vapor deposition – Work support
Patent
1991-05-06
1992-12-01
Bueker, Richard
Coating apparatus
Gas or vapor deposition
Work support
118715, 118725, 118500, C23C 1600
Patent
active
051677180
ABSTRACT:
Disclosed is an improved parylene deposition chamber wherein reactive monomer vapors enter the chamber tangentially so as to create a rotational flow of vapor within the interior of the chamber. A substrate support fixture is positioned within the chamber and rotated in a direction counter to the rotational flow of vapor. An annular space exists between the outer edge of the fixture and the inner wall of the chamber so as to allow the rotating vapor to descend freely within the chamber. Waste of parylene chemicals is minimized by eliminating the need for the positioning of baffles within the chamber.
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