Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1982-03-18
1984-03-13
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430168, 430169, 430175, 430176, 430302, 430141, 430154, 260141, G03C 154, C07C11304
Patent
active
044368046
ABSTRACT:
This invention relates to novel condensation products, novel light-sensitive condensation products of aromatic diazonium salts, processes for preparation thereof, and to light-sensitive reproduction materials, which latter comprise a support having a reproduction layer containing at least one of the novel light-sensitive products. The light-sensitive condensation products are prepared by first homo-condensing non-diazo containing monomers of the structure R--M--R to form an oligomer. The oligomer is next condensed with an aromatic diazonium salt form the desired novel light-sensitive condensation product. R is a reactive substituent capable of undergoing condensation reactions in acid medium. M is selected from the group consisting of aromatic hydrocarbons, diaryl ethers, diaryl sulfides, diaryl amines, diaryl sulfones, diaryl ketones and diaryl diketones. The resulting novel light-sensitive condensation products have approximately four times the speed of prior art compounds.
REFERENCES:
patent: 3679419 (1972-07-01), Gillich
patent: 3849392 (1974-11-01), Steppan
patent: 3867147 (1975-02-01), Tuescher
patent: 4288520 (1981-09-01), Sprintschnik
American Hoechst Corporation
Bowers Jr. Charles L.
Burnett Leo S.
Roberts Richard S.
Tully Michael J.
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