Electron beam exposure apparatus

Details Electron beam exposure apparatus Electron beam exposure apparatus

1976-04-08

1977-12-13

Smith, Alfred E.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250442, 250398, H01J 3726

Patent

active

040631036

ABSTRACT:
A radiant beam exposure apparatus forms a desired pattern on a workpiece disposed on a carriage movable in both directions X and Y which intersect at a right angle. The distance over which the carriage moves is measured by a laser interferometer. In response to the output of the interferometer, a pulse generating circuit generates one pulse for each n/m wavelength of laser light. The pulse signal is supplied from the pulse generating circuit to a memory device storing information corresponding to the pattern and at the same time to a deflection signal generator. Upon receipt of the pulse signal, the memory device reads out the information, and the deflection signal generator generates a deflection signal. The information signal is supplied from the memory device to a blanking signal generator. In response to the information signal, the blanking signal generator generates a blanking signal, which is supplied together with the deflection signal to a radiant beam scanning device, thereby forming the desired pattern on the workpiece.

REFERENCES:
patent: 3648048 (1972-03-01), Cahan et al.
patent: 3699334 (1972-10-01), Cohen et al.
patent: 3900737 (1975-08-01), Collier et al.
patent: 3903486 (1975-09-01), Bert et al.

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