Process for the preparation of functional tin oxide thin films

Details Process for the preparation of functional tin oxide thin films Process for the preparation of functional tin oxide thin films

1987-04-02

1990-06-05

Nguyen, Nam X.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 85, 427 86, 427 87, 4271263, B05D 306

Patent

active

049313088

ABSTRACT:
Process for preparing a functional tin oxide thin film by reducing a raw material gas capable of contributing to formation of the tin oxide thin film either with the action of an excitation energy source such as high frequency, direct-current, microwave or light, or both with the action of such excitation energy source and the action of a reducing gas under reduced atmospheric inner pressure condition in a substantially enclosed reaction chamber containing the substrate upon which the tin oxide thin film is to be deposited, and oxidizing the resultant reduced active species with on oxidizing gas to thereby deposit the tin oxide thin film on the substrate at a low temperature and at high deposition rates without any significant powder.

REFERENCES:
patent: 3991227 (1976-11-01), Carlson et al.
patent: 3991228 (1976-11-01), Carlson et al.
patent: 4317844 (1982-03-01), Carlson
patent: 4505950 (1985-03-01), Yamasaki
patent: 4522663 (1985-06-01), Ovshinsky et al.
patent: 4652463 (1987-03-01), Peters

Affiliated with

Also associated with

Rating

Process for the preparation of functional tin oxide thin films does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for the preparation of functional tin oxide thin films, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for the preparation of functional tin oxide thin films will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-490850