Photosensitive mixture containing photocurable compound and poly

Details Photosensitive mixture containing photocurable compound and poly Photosensitive mixture containing photocurable compound and poly

1992-01-23

1993-09-07

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430176, 430197, 430270, 430271, 430281, 430906, 430909, G03F 7012, G03F 7021

Patent

active

052427790

ABSTRACT:
A photosensitive mixture is disclosed that contains a photocurable compound, for example, a diazonium salt polycondensation product, or a photocurable combination of compounds, for example, a photopolymerizable mixture, and a polymeric binder, which binder is a graft copolymer with a polyurethane graft backbone onto which chains containing vinyl alcohol units and vinyl acetal units derived from hydroxyaldehydes are grafted. The mixture is suitable for use in the production of printing plates and photoresists, can be developed with purely aqueous solutions, and gives printing plates distinguished by high resistance to mechanical and chemical attacks.

REFERENCES:
patent: 3660097 (1972-05-01), Mainthia
patent: 3867147 (1975-02-01), Teuscher
patent: 4186017 (1980-01-01), Palmer
patent: 4337307 (1982-06-01), Neubauer
patent: 4387151 (1983-06-01), Bosse et al.
patent: 4526854 (1985-07-01), Watanabe et al.
patent: 4631245 (1986-12-01), Pawlowski
patent: 4659645 (1987-04-01), Frommeld et al.

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