Process for manufacturing metal silicide photomask

Details Process for manufacturing metal silicide photomask Process for manufacturing metal silicide photomask

1986-03-31

1987-04-28

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430296, 430323, 430324, 430942, 428428, G03F 900

Patent

active

046614265

ABSTRACT:
A metal silicide photomask manufacturing process including a step of forming metal silicide film on a transparent silica glass substrate. A resist is applied onto the metal silicide film and then a patterning mask is drawn by using light or electron beam, followed by developing step, so that some portion of the applied resist can be removed wherein the metal silicide is exposed. Scum is removed by oxygen plasma etching process, thereby to form an oxide film on an exposed portion of the metal silicide. The left resist portion and the portion of the metal silicide film laying under the resist portion is etched away using a dry etching process in which the oxide film serves as a mask.

REFERENCES:
patent: 4393127 (1983-07-01), Greschner et al.

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