Electron-beam exposure system having an improved rate of exposur

Details Electron-beam exposure system having an improved rate of exposur Electron-beam exposure system having an improved rate of exposur

1994-05-11

1995-09-05

Willis, Davis L.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250398, H01J 37302

Patent

active

054480752

ABSTRACT:
An electron beam exposure system includes a pattern memory for storing bitmap data of a pattern to be exposed, wherein the pattern memory includes a number of latch elements arranged in rows and columns such that the writing of the bitmap data is achieved line by line and such that the reading of the bitmap data is achieved column by column.

REFERENCES:
patent: 5369282 (1994-11-01), Arai et al.

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