Method for determining a reliable oxide thickness

Electricity: measuring and testing – Fault detecting in electric circuits and of electric components – Of individual circuit component or element

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

324766, 438 14, G01N 2792, G01R 3112, H01L 2166

Patent

active

061337463

ABSTRACT:
A method for determining a reliable gate oxide thickness for a transistor involves subjecting test transistors to an alternating current (AC) voltage until the test transistors break down. The breakdown times of the test transistors are measured and correlated with the corresponding gate oxide thickness of the test transistor to form a reliability model of the transistor. The reliable gate oxide thickness is determined by extrapolating the reliability model out to a predetermined period of time for which reliability is desired, for example, ten years.

REFERENCES:
patent: 5548224 (1996-08-01), Gabriel et al.
patent: 5650336 (1997-07-01), Eriguchi et al.
patent: 5793212 (1998-08-01), Om
patent: 5801538 (1998-09-01), Kwon

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for determining a reliable oxide thickness does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for determining a reliable oxide thickness, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for determining a reliable oxide thickness will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-472755

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.