MOSFET transistor

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

357 90, H01L 2978

Patent

active

040926613

ABSTRACT:
An n channel MOSFET transistor which includes doping of previously formed source and drain elements with a heavy diffusion of phosphorous or arsenic creating n++ regions in the source and drain. The extra diffusion step is preferably accomplished just prior to contact metalization.

REFERENCES:
patent: 3737347 (1973-06-01), Alcott et al.
patent: 3967981 (1976-07-01), Yamazaki
Platt et al., "FET Fabrication," IBM TDB, vol. 14, No. 1, Jun. 1971, pp. 247-248.
Krick et al., "Integratable, Symmetrical, High-Voltage MOSFET Structure," IBM TDB, vol. 15, No. 6, Nov. 1972, pp. 1884-1885.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

MOSFET transistor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with MOSFET transistor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and MOSFET transistor will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-472745

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.