Process for supplying a gas, especially of diborane and silane

Details Process for supplying a gas, especially of diborane and silane Process for supplying a gas, especially of diborane and silane

1993-11-15

1995-09-05

Beck, Shrive

Coating processes

Measuring, testing, or indicating

427255, 4272551, 4272553, 73 2405, 137 4, 137 91, 137 92, B05D 100

Patent

active

054477441

ABSTRACT:
A process for supplying a gas to a reactor comprising the steps of:

REFERENCES:
patent: 4369031 (1983-01-01), Goldman et al.
patent: 4546016 (1985-10-01), Kern
patent: 5190913 (1993-02-01), Higashiyama et al.
Japanese Abstracts of Japan, No. JP3290395; Hirayama Hiroyuki, "Gas Source Molecular Ray Epitaxial Growth Device", Dec. 20, 1991.

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