Polishing pad and method of use

Details Polishing pad and method of use Polishing pad and method of use

1996-05-24

1998-03-31

Rose, Robert A.

Abrading

Abrading process

Glass or stone abrading

451285, 451286, 451287, 451288, 451289, 451527, 451539, 451921, 437228, 1566361, B24B 100

Patent

active

057331766

ABSTRACT:
A novel polishing pad having voids and optional abrasives incorporated therein is disclosed. The contents of each void facilitates the detection of the end point at which the polishing pad becomes worn out during a polishing operation. Chemicals stored within voids are released by the breaching of the voids caused by the polishing operation. The chemical released is selected to halt the chemical polishing, change the color of the pad, or to detectably change the torque load on the rotating fixed abrasive pad. Empty voids cause an noise from fluids such as air being forced into the voids. The visual or audible diagnostic resulting from the breaching of voids help to control the polishing operation and thus increase yield.

REFERENCES:
patent: 4019289 (1977-04-01), Korver
patent: 5144773 (1992-09-01), Flores et al.
patent: 5439551 (1995-08-01), Meikle et al.
patent: 5483568 (1996-01-01), Yano et al.

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