Photo mask and exposure method using the same

Details Photo mask and exposure method using the same Photo mask and exposure method using the same

1997-11-25

2000-10-17

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

061329088

ABSTRACT:
A photo mask for a lithography process enables the formation of high contrast image and facilitates manufacturing. The photo mask includes a transparent portion for an illumination light and a half-transparent part having a predetermined transmittance for the illumination light. These transparent and half-transparent portions are so constructed that a phase of a transmitted light beam from the half-transparent portion has a phase difference of 2 n.pi. or (2 n+1).pi. radian relative to a light beam passed through a transparent portion. Another type of photo mask includes transparent portion for the illumination light and a light shielding portion against the illumination light. At least a part of the shielding portion has a multilayer construction. An edge at least portion of the shielding portion has a different transmittance for the illumination light then a central portion surrounded by the edge portion.

REFERENCES:
patent: 4415262 (1983-11-01), Koyama et al.
patent: 4530891 (1985-07-01), Nagarekawa et al.
patent: 4738886 (1988-04-01), Uchida
patent: 4890309 (1989-12-01), Smith et al.
patent: 5045417 (1991-09-01), Okamoto
patent: 5290647 (1990-10-01), Miyazaki et al.

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