Method and apparatus for continuous processing of semiconductor

Details Method and apparatus for continuous processing of semiconductor Method and apparatus for continuous processing of semiconductor

1999-03-31

2000-10-17

Mayekar, Kishor

Chemistry: electrical and wave energy

Apparatus

Electrolytic

204212, 204224M, 204224R, 204623, C25D 1700

Patent

active

061325708

ABSTRACT:
An electrochemical reaction assembly and methods of inducing electrochemical reactions, such as for deposition of materials on semiconductor substrates. The assembly and method achieve a highly uniform thickness and composition of deposition material or uniform etching or polishing on the semiconductor substrates by retaining the semiconductor substrates on a moving cathode immersed in an appropriate reaction solution wherein a wire mesh anode rotates about the moving cathode during electrochemical reaction.

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