Arrangement for producing a gas flow which is enriched with the

Details Arrangement for producing a gas flow which is enriched with the Arrangement for producing a gas flow which is enriched with the

1989-01-10

1990-08-14

Bueker, Richard

Coating apparatus

Gas or vapor deposition

118724, 118726, 427252, C23C 1600

Patent

active

049477900

ABSTRACT:
An arrangement for producing a gas flow which is enriched with the vapor of a low-volatile material. The arrangement comprises a vessel (1) having an interior space (12) for holding a powder bed (13), which consists of a low-volatile material and an additional solid inert component. The vessel is arranged in a thermostatically controlled bath (2). A gas flow (4, 16) consisting of an inert gas flows through the arrangement, preferably in the direction of the gravitational force. The gas flow passes, in this sequence, through a thick gas inlet plate (10), the powder bed (13) and a thin gas outlet plate (14). By proper dimensioning the component parts of the arrangement and providing a low pressure in the arrangement a high mass flow of the low-volatile material with a flow constant of a long duration is achieved. The enriched gas flow is conducted, for example, to a low-pressure CVD reactor.

REFERENCES:
patent: 2704727 (1955-03-01), Pawlyk
patent: 2738762 (1956-03-01), Pawlyk
patent: 2749255 (1956-06-01), Nack et al.
patent: 3889388 (1975-06-01), Oguri et al.
Peters, Max S. and Klaus D. Timmerhaus, Plant Design and Economics for Chemical Engineers, Third Ed., (McGraw-Hill, 1980), p. 749.

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