Immersion type projection exposure apparatus

Details Immersion type projection exposure apparatus Immersion type projection exposure apparatus

1995-06-05

1997-03-11

Braun, Fred L.

Photocopying

Projection printing and copying cameras

Step and repeat

G03B 2742

Patent

active

056106831

ABSTRACT:
A projection exposure apparatus includes an illuminating device for illuminating a pattern of an original, a holder for holding a substrate, and a projection system for projecting an image of the pattern of the original onto the substrate. The projection system includes a projection optical system and a plane optical element spaced from the projection optical system and disposed opposite to the surface of the substrate. Also provided is a casing having a filled interspace formed between the optical element and the substrate, with the optical element providing an upper cover of the casing.

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D. W. Pohl, et al., "Optical Stethoscopy: Image Recording with Resolution .lambda./20", Applied Physics Letters, vol. 44, No. 7, pp. 651-653 (Apr. 1, 1984).
H. Kawata, et al., "Optical Projection Lithography Using Lenses with Numerical Apertures Greater Than Unity", Microelectronic Engineering, International Conference on Microlithography, vol. 9, No. 1-4, pp. 31-36 (May, 1988).

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