Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1995-03-24
1997-03-11
Anderson, Bruce C.
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
250400, H01J 3704
Patent
active
056104065
ABSTRACT:
A charged particle beam exposure method which irradiates a charged particle beam on a substrate placed on a stage while continuously moving the stage and deflecting the charged particle beam by main deflector means and sub deflector means. The charged particle beam exposure method includes the steps of calculating stage moving information which describes an optimum expected locus of a stage moving speed with respect to a frame region based on a stage moving speed that enables exposure within each cell region within the frame region, by defining the frame region as being made up of a plurality of cell regions arranged in a moving direction of the stage within a drawable range in which the charged particle beam can be deflected by the main deflector means, and controlling a deflected position of the charged particle beam caused by the main deflector means by variably controlling the stage moving speed based on said stage moving information.
REFERENCES:
patent: 4410800 (1983-10-01), Yoshikawa
patent: 4891524 (1990-01-01), Yasuda et al.
patent: 5180920 (1993-01-01), Kai et al.
patent: 5194741 (1993-03-01), Sakamoto et al.
patent: 5334846 (1994-08-01), Nakano et al.
Kai Jun-ichi
Nakano Mitsuhiro
Anderson Bruce C.
Fujitsu Limited
LandOfFree
Charged particle beam exposure method and apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Charged particle beam exposure method and apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Charged particle beam exposure method and apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-445244