Diaphragm system for generating a plurality of particle probes h

Details Diaphragm system for generating a plurality of particle probes h Diaphragm system for generating a plurality of particle probes h

1989-06-13

1990-02-06

Berman, Jack I.

Radiant energy

Radiation controlling means

2504922, H01J 152, H01J 312

Patent

active

048990604

ABSTRACT:
A diaphragm system includes two diaphragms provided with the same multi-aperture arranged following one another in a beam path of lithography equipment so that recesses in the first diaphragm coincide with corresponding recesses in the second diaphragm. A primary particle beam is directed onto the first diaphragm which is equipped with deflection elements for individual displacement of the particle probes in a plane of the second diaphragm. In a second embodiment, the diaphragm system provides simultaneous variation of the cross section of all particle probes by providing that one of the two diaphragms be displaceable in a plane perpendicular to the beam direction.

REFERENCES:
patent: 4182958 (1980-01-01), Goto et al.
patent: 4524278 (1985-06-01), LePoole
Hans C. Pfeiffer, "Recent Advances in Electron-Beam Lithography for the High-Volume Production of VLSI Devices", IEEE Transactions on Electron Devices, vol. ED-26, No. 4, Apr. 1979, pp. 663-674.

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