Positive photosensitive o-quinone diazide composition with benzo

Details Positive photosensitive o-quinone diazide composition with benzo Positive photosensitive o-quinone diazide composition with benzo

1987-04-30

1989-07-11

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430165, 430190, 430192, 430193, G03C 160

Patent

active

048471780

ABSTRACT:
A positive type photosensitive composition capable of improving the drawback in the conventional positive type photosensitive resin composition, improving adhesion between the positive type photoresist and the substrate and improving developability is provided by incorporating benzotriazole carboxylic acids in the positive type photoresist.

REFERENCES:
patent: 3661582 (1972-05-01), Broyde
patent: 3859099 (1975-01-01), Petropoulos et al.
patent: 4036644 (1977-07-01), Kaplan et al.
patent: 4365019 (1982-12-01), Daly et al.
patent: 4438190 (1984-03-01), Ishimara et al.
Hamel, C. J., IBM Technical Disclosure Bulletin, vol. 18, No. 6, 11/1975, p. 1775.

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