Coating apparatus – Gas or vapor deposition – With treating means
Patent
1988-10-03
1990-02-06
Bueker, Richard
Coating apparatus
Gas or vapor deposition
With treating means
427 39, C23C 1600
Patent
active
048981184
ABSTRACT:
Disclosed herein is an apparatus for forming a deposited film by a microwave plasma CVD process comprising introducing a film-forming raw material gas into a reaction vessel capable of being vacuum sealed, and generating a microwave-excited plasma in the reaction vessel to deposit a film on a substrate for film deposition disposed in the reaction vessel. The apparatus comprises a rectangular waveguide for transmitting microwave energy, a pair of microwave cutoff cavities having different cutoff frequencies, the cavities being oppositely disposed on opposite sides of the waveguide, and a reaction vessel disposed to penetrate through the waveguide and the microwave cutoff cavities, wherein a raw material gas inlet is provided at one end of the reaction vessel, and a film deposition space is provided at the other end of the reaction vessel, whereby it is possible to use effectively the plasma generated in the reaction vessel for film deposition without leakage of the plasma into the cavity on the gas inlet side, and to perform stable film deposition with good reproducibility.
REFERENCES:
patent: 4401054 (1983-08-01), Matsuo
patent: 4532199 (1985-07-01), Ueno
Kanai Masahiro
Murakami Tsutomu
Bueker Richard
Canon Kabushiki Kaisha
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