Solid diffusion source of GD oxide/P205 compound and method of m

Details Solid diffusion source of GD oxide/P205 compound and method of m Solid diffusion source of GD oxide/P205 compound and method of m

1988-05-19

1989-07-11

Chaudhuri, Olik

Metal treatment

Barrier layer stock material, p-n type

252951, 437168, 423263, H01L 21225

Patent

active

048469025

ABSTRACT:
A doping composition having a high rate of P.sub.2 O.sub.5 evolution as indicated by a thick deposited glassy film of about 1500-2000 angstroms at a doping temperature of only 900.degree. C. for one hour, the composition comprising a gadolinium oxide/P.sub.2 O.sub.5 compound.

REFERENCES:
patent: 4000247 (1976-12-01), Yamada et al.
patent: 4025464 (1977-05-01), Yamashita et al.
patent: 4033790 (1977-07-01), Gunjigake et al.
patent: 4141738 (1979-02-01), Rapp
patent: 4152286 (1979-05-01), Crosson et al.
patent: 4160672 (1979-07-01), Rapp
patent: 4175988 (1979-11-01), Rapp

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