Optical arrangement for projection exposure

Details Optical arrangement for projection exposure Optical arrangement for projection exposure

1989-05-30

1990-03-06

Sugarman, Scott J.

350448, 350475, G02B 1318, G02B 914

Patent

active

049060805

ABSTRACT:
An optical arrangement for projection exposure includes an illuminating system adapted to supply an illumination light usable for illuminating an original, an imaging system effective to form an image of the original on a predetermined image plane, and an optical element operable so that an angle of inclination of a chief ray of the illumination light, with respect to an optical axis of the imaging system, and an angle of inclination, with respect to said optical axis, of a chief ray defined by the imaging system and lying on a light-entrance side of the imaging system, are made substantially equal to each other.

REFERENCES:
patent: 4637691 (1987-01-01), Uehara et al.
patent: 4682885 (1987-07-01), Torigoe

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