Exposure apparatus

Details Exposure apparatus Exposure apparatus

2007-04-30

2011-12-27

Nguyen, Hung Henry (Department: 2882)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000, C355S067000, C355S077000, C359S619000

Reexamination Certificate

active

08085384

ABSTRACT:
An exposure apparatus that exposes a pattern of an original onto a substrate includes a condenser optical system configured to split light from a light source into plural rays, to condense the plural rays at different positions on the original, and to make a central part of each of the plural rays that illuminate the original darker than a periphery at the Fourier transform plane with respect to the original, and a projection optical system configured to project the pattern of the original onto the substrate.

REFERENCES:
patent: 5242770 (1993-09-01), Chen et al.
patent: 5621499 (1997-04-01), Shiozawa
patent: 6049374 (2000-04-01), Komatsuda et al.
patent: 6096461 (2000-08-01), Gelbart
patent: 6107011 (2000-08-01), Gelbart
patent: 6628730 (2003-09-01), Stott et al.
patent: 6855486 (2005-02-01), Finders et al.
patent: 2001/0024372 (2001-09-01), Hamanaka et al.
patent: 2002/0005940 (2002-01-01), Hatada et al.
patent: 2002/0008863 (2002-01-01), Taniguchi et al.
patent: 2002/0167653 (2002-11-01), Mulkens et al.
patent: 2003/0035089 (2003-02-01), Chandhok et al.
patent: 2003/0156269 (2003-08-01), Komatsuda et al.
patent: 2004/0057033 (2004-03-01), McCullough et al.
patent: 2005/0012916 (2005-01-01), Van Der Mast et al.
patent: 2000-228358 (2000-08-01), None

Affiliated with

Also associated with

Rating

Exposure apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4315919