Dual metric OPC

Details Dual metric OPC Dual metric OPC

2010-08-17

2011-12-27

Rosasco, Stephen (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C716S050000

Reexamination Certificate

active

08084169

ABSTRACT:
A technique for creating mask layout data to print a desired pattern of features via a photolithographic process includes defining one or more subresolution assist features (SRAFs) and performing OPC on printing features and the added SRAF features.

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