Simulation model creating method, mask data creating method...

Details Simulation model creating method, mask data creating method... Simulation model creating method, mask data creating method...

2009-03-18

2011-11-08

Bahta, Kidest (Department: 2122)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

C700S121000, C716S050000, C703S002000, C703S013000, C382S144000, C430S005000

Reexamination Certificate

active

08055366

ABSTRACT:
A simulation model creating method computes, for measurement results of a line width of a resist pattern formed with varied an exposure amount and focus value, a permissible fluctuation range of the pattern line width from a distribution of the exposure amount and a distribution of the focus value; computes difference values between the measurement results and corresponding approximation values on a fitting function which has the exposure amount and focus value as parameters; compares the difference values with the permissible fluctuation range; deletes any measurement values for which the difference value is larger than the permissible fluctuation range, and recomputes the fitting function accordingly; and deletes measurement values outside a permissible fluctuation range of a pattern line width of the mask, and creates a simulation model.

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Liebmann, L. W. et al., “Optical Proximity Correction: a First Look at Manufacturability,” Abstract of Proc. SPIE, vol. 2322, pp. 229-238, (1994).

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