Chemistry: molecular biology and microbiology – Measuring or testing process involving enzymes or... – Involving nucleic acid
Reexamination Certificate
2011-01-21
2011-11-22
Boykin, Terressa (Department: 1765)
Chemistry: molecular biology and microbiology
Measuring or testing process involving enzymes or...
Involving nucleic acid
C430S270100, C430S323000, C430S325000, C430S330000, C522S031000, C522S059000, C522S065000, C528S073000, C530S300000, C536S023100, C536S025300, C568S029000, C568S030000, C568S034000, C568S306000, C568S325000
Reexamination Certificate
active
08062844
ABSTRACT:
Protective groups which may be cleaved with an activatable deprotecting reagents are employed to achieve a highly sensitive, high resolution, combinatorial synthesis of pattern arrays of diverse polymers. In preferred embodiments of the instant invention, the activatable deprotecting reagent is a photoacid generator and the protective groups are DMT for nucleic acids and tBOC for amino acids. This invention has a wide variety of applications and is particularly useful for the solid phase combinatorial synthesis of polymers.
REFERENCES:
patent: 4996136 (1991-02-01), Houlihan et al.
patent: 5135838 (1992-08-01), Houlihan et al.
patent: 5143854 (1992-09-01), Pirrung et al.
patent: 5200544 (1993-04-01), Houlihan et al.
patent: 5527656 (1996-06-01), Imai et al.
patent: 5609989 (1997-03-01), Bantu et al.
patent: 5665792 (1997-09-01), Lawton et al.
patent: 6083697 (2000-07-01), Beecher et al.
patent: 6159665 (2000-12-01), Chin et al.
patent: 6310083 (2001-10-01), Kao et al.
patent: 6426184 (2002-07-01), Gao et al.
patent: 6660479 (2003-12-01), Kim et al.
patent: 6887665 (2005-05-01), Trulson et al.
patent: 7053198 (2006-05-01), Goldberg et al.
patent: 7332477 (2008-02-01), Cammack et al.
patent: 7452673 (2008-11-01), McGall et al.
patent: 7544721 (2009-06-01), Gaud et al.
patent: 7790389 (2010-09-01), Trulson
patent: 2004/0110133 (2004-06-01), Xu
patent: 2005/0164258 (2005-07-01), Goldberg et al.
patent: 2006/0292628 (2006-12-01), Quate
patent: 2007/0275411 (2007-11-01), McGall
patent: 2009/0270279 (2009-10-01), Serafinowski et al.
patent: 1547678 (2005-06-01), None
patent: WO 97/39151 (1997-10-01), None
patent: WO 98/20967 (1998-05-01), None
patent: WO 99/41007 (1999-08-01), None
patent: WO 00/75372 (2000-12-01), None
patent: WO 03/052383 (2003-06-01), None
patent: WO 2006/117556 (2006-11-01), None
Amit et al., “Photosensitive protecting groups—a review,” Israel Journal of Chemistry, 12(1-2): 103-113, (1974).
Barzynski et al., “Zur Photolyse von makromolekularen o-Nitrobenzylderivaten,” Die Angewandte Makromolekulare Chemie, 93: 131-141 (1981).
Beecher et al., “Chemically Amplified Photolithography for the Fabrication of High Density Oligonucleotide Arrays,” Polymeric Materials Science and Engineering, 76: 597-598 (1997).
Dussy et al., “New light-sensitive nucleosides for caged DNA strand breaks,” ChemBioChem, 3: 54-60 (2002).
Funato et al., “Photodecomposable Bases: A Novel Concept to Stabilize Chemically Amplified Resists,” Journal of Photopolymer Science and Technology, 8(4): 543-545 (1995).
Gao et al., “Oligonucleotide synthesis using solution photogenerated acids,” Journal of the American Chemical Society, 120: 12698-12699 (1998).
Garland and Serafinowski, “Effects of Stray Light on the Fidelity of Photodirected Oligonucleotide Array Synthesis” Nucleic Acids Research, 30(19):e99 (2002).
Hevesi et al., “Contribution to the Mechanism of the Acid-Catalyzed Hydrolysis of Purine Nucleosides,” Journal of the American Chemical Society, 94(13): 4715-4720 (1972).
Houlihan et al., “Design, synthesis, characterization, and use of all-organic nonionic photogenerators of acid,” Chemistry of Materials, 3: 462-471 (1991).
Michaelson et al., “Understanding the Role of Base Quenchers in Photoresists,” Advances in Resist Technology and Processing XXI, Proceedings of SPIE, 5376: 1282-1293 (2004).
Reichmanis et al., “A study of the photochemical response of o-nitrobenzyl cholate derivatives in P(MMA-MAA) matrices,” Journal of Polymer Science, 21: 1075-1083 (1983).
Reichmanis et al., “o-Nitrobenzyl photochemistry: solution vs. solid-state behavior,” Journal of Polymer Science, 23: 1-8 (1985).
Robles and Bochet, “Photochemical release of aldehydes from α-acetoxy nitroveratryl ethers,” Organic Letters, 7(16): 3545-3547 (2005).
Shirai and Tsunooka, “Photoacid and Photobase Generators: Chemistry and Applications to Polymeric Materials,” Prog. Poly. Sci., 21: 1-45 (1996).
Singh-Gasson et al., “Maskless fabrication of light-directed oligonucleotide microarrays using a digtal micromirror array,” Nature Biotechnology, 17: 974-978 (1999).
Thompson et al., “Introduction to Microlithography,” 2nd Ed., American Chemical Society, pp. 212-232 (1994).
Tsao et al., “Matrix and time-resolved infrared spectroscopy of cholor-p-nitrophenylcarbene and related species,” Journal of Physical Chemistry A, 105: 8413-8416 (2001).
Walbert et al., “Photolabile protecting groups for nucleosides: mechanistic studies of the 2-(2-nitrophenyl)ethyl group,” Helvetica Chimica Acta, 84: 1601-1611 (2001).
Wallraff et al., “DNA sequencing on a chip”, ChemTech, pp. 22-32 (Feb. 1997).
Wallruff and Hinsberg, “Lithographic Imaging Techniques for the Formation of Nanoscopic Features,” Chemical Review, 99: 1801-1821 (1999).
Goldberg Martin J.
Kuimelis Robert G.
McGall Glenn H.
Xu Guangyu
Affymetrix Inc.
Boykin Terressa
LandOfFree
Use of acid scavengers for the synthesis of standard length... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Use of acid scavengers for the synthesis of standard length..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Use of acid scavengers for the synthesis of standard length... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4305667