Exposure apparatus, exposure method, and device producing...

Photocopying – Projection printing and copying cameras – Detailed holder for photosensitive paper

Reexamination Certificate

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C355S053000

Reexamination Certificate

active

08064044

ABSTRACT:
An exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) on the substrate (P) via a projection optical system (PL) and a liquid (LQ) supplied from a liquid supply mechanism (10). The exposure apparatus (EX) has a pressure adjustment mechanism (90) for adjusting pressure of the liquid (LQ) supplied from the liquid supply mechanism (10). A liquid immersion area is satisfactorily formed to obtain high exposure accuracy and measurement accuracy.

REFERENCES:
patent: 32795 (1861-07-01), Soule
patent: 4346164 (1982-08-01), Tabarelli et al.
patent: 4480910 (1984-11-01), Takanashi et al.
patent: 5493403 (1996-02-01), Nishi
patent: 5528118 (1996-06-01), Lee
patent: 5610683 (1997-03-01), Takahashi
patent: 5623853 (1997-04-01), Novak et al.
patent: 5646413 (1997-07-01), Nishi
patent: 5699145 (1997-12-01), Makinouchi et al.
patent: 5715039 (1998-02-01), Fukuda et al.
patent: 5825043 (1998-10-01), Suwa
patent: 5874820 (1999-02-01), Lee
patent: 5969441 (1999-10-01), Loopstra et al.
patent: 6118515 (2000-09-01), Wakamoto et al.
patent: 6195154 (2001-02-01), Imai
patent: 6208407 (2001-03-01), Loopstra
patent: 6341007 (2002-01-01), Nishi et al.
patent: 6400441 (2002-06-01), Nishi et al.
patent: 6549269 (2003-04-01), Nishi et al.
patent: 6590634 (2003-07-01), Nishi et al.
patent: 6969441 (2005-11-01), Welch et al.
patent: 7495744 (2009-02-01), Nagaksaka
patent: 7515246 (2009-04-01), Nagasaka et al.
patent: 2002/0041377 (2002-04-01), Hagiwara et al.
patent: 2002/0061496 (2002-05-01), Walker
patent: 2004/0114117 (2004-06-01), Bleeker
patent: 2004/0165159 (2004-08-01), Lof et al.
patent: 2004/0207824 (2004-10-01), Lof et al.
patent: 2004/0257544 (2004-12-01), Vogel et al.
patent: 2005/0018155 (2005-01-01), Cox et al.
patent: 2005/0018156 (2005-01-01), Mulkens et al.
patent: 2005/0030498 (2005-02-01), Mulkens
patent: 2005/0174550 (2005-08-01), Streefkerk et al.
patent: 2005/0179877 (2005-08-01), Mulkens et al.
patent: 2005/0219481 (2005-10-01), Cox et al.
patent: 2005/0259233 (2005-11-01), Streefkerk et al.
patent: 2005/0259234 (2005-11-01), Hirukawa et al.
patent: 2005/0270506 (2005-12-01), Streefkerk et al.
patent: 2006/0114445 (2006-06-01), Ebihara
patent: 2006/0126045 (2006-06-01), Ono et al.
patent: 2006/0139613 (2006-06-01), Houkes et al.
patent: 2006/0209278 (2006-09-01), Kiuchi et al.
patent: 2007/0081136 (2007-04-01), Hara
patent: 221 563 (1985-04-01), None
patent: 224 448 (1985-07-01), None
patent: 0 605 103 (1994-07-01), None
patent: 1 498 778 (2005-01-01), None
patent: 1 524 558 (2005-04-01), None
patent: 1 528 433 (2005-05-01), None
patent: 1 571 697 (2005-09-01), None
patent: 1 703 548 (2006-09-01), None
patent: A-57-117238 (1982-07-01), None
patent: A-58-202448 (1983-11-01), None
patent: A-59-019912 (1984-02-01), None
patent: A-S59-19912 (1984-02-01), None
patent: A-62-065326 (1987-03-01), None
patent: A-62-65326 (1987-03-01), None
patent: A-63-157419 (1988-06-01), None
patent: A-4-65603 (1992-03-01), None
patent: A-4-305915 (1992-10-01), None
patent: A-04-305915 (1992-10-01), None
patent: A-04-305917 (1992-10-01), None
patent: A-4-305917 (1992-10-01), None
patent: A-05-062877 (1993-03-01), None
patent: A-5-62877 (1993-03-01), None
patent: A 6-53120 (1994-02-01), None
patent: A-06-124873 (1994-05-01), None
patent: A-H6-124873 (1994-05-01), None
patent: A-06-168866 (1994-06-01), None
patent: A-H6-168866 (1994-06-01), None
patent: A 6-188169 (1994-07-01), None
patent: A-7-176468 (1995-07-01), None
patent: A-7-220990 (1995-08-01), None
patent: A-07-220990 (1995-08-01), None
patent: A-8-37149 (1996-02-01), None
patent: A 8-166475 (1996-06-01), None
patent: A-08-316125 (1996-11-01), None
patent: A-8-316125 (1996-11-01), None
patent: A 8-330224 (1996-12-01), None
patent: A 10-163099 (1998-06-01), None
patent: A 10-214783 (1998-08-01), None
patent: A-10-303114 (1998-11-01), None
patent: A-10-340846 (1998-12-01), None
patent: A-11-16816 (1999-01-01), None
patent: A-11-135400 (1999-05-01), None
patent: A-11-176727 (1999-07-01), None
patent: A-11-204390 (1999-07-01), None
patent: A-2000-58436 (2000-02-01), None
patent: A-2000-058436 (2000-02-01), None
patent: A 2000-505958 (2000-05-01), None
patent: A-2002-14005 (2002-01-01), None
patent: A-2004-289126 (2004-10-01), None
patent: A-2005-045223 (2005-02-01), None
patent: A-2005-057278 (2005-03-01), None
patent: A-2005-085789 (2005-03-01), None
patent: WO 99/49504 (1999-09-01), None
patent: WO 2004/019128 (2004-03-01), None
patent: WO 2004/053955 (2004-06-01), None
patent: WO 2004/055803 (2004-07-01), None
patent: WO 2004/090634 (2004-10-01), None
patent: WO 2004/093160 (2004-10-01), None
patent: WO 2004/114380 (2004-12-01), None
patent: WO 2005/006416 (2005-01-01), None
patent: WO 2005/006417 (2005-01-01), None
patent: WO 2005/067013 (2005-07-01), None
patent: WO 2005/093791 (2005-10-01), None
Owa et al., “Immerson Lithography; its potential performance and issues”, Proceedings of Spie, Feb. 28, 2003, pp. 724-733, vol. 5040, No. 1, Bellingham, VA.
June 22, 2010 Notice of Reasons for Rejection issued in Japanese Application No. 2004-375494 with English translation.
Apr. 19, 2005 International Search Report for International Application No. PCT/JP2004/019813.
Feb. 24, 2009 Office Action issued in European Patent Application No. 04 808 163.2.
Apr. 22, 2011 Office Action issued in Korean Patent Application No. 2006-7008813 (with translation).

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