Exposure apparatus and method for manufacturing device

Details Exposure apparatus and method for manufacturing device Exposure apparatus and method for manufacturing device

2008-07-02

2011-11-29

Nguyen, Hung Henry (Department: 2882)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S055000

Reexamination Certificate

active

08068211

ABSTRACT:
An exposure apparatus for exposing a shot region on a substrate includes a movable stage, a projection optical system, a measuring device configured to measure a position of a partial region of a surface of the substrate, and a controller configured to cause the measuring device to measure the position with respect to each of a plurality of measurement points of each of a plurality of shot regions, to determine a global shape of the surface based on the measured positions, to calculate a correction value with respect to each of the plurality of measurement points based on the determined global shape, and to move the stage based on measurement values corrected using the respective correction values corresponding to the respective measurement points.

REFERENCES:
patent: 6081614 (2000-06-01), Yamada et al.
patent: 7583356 (2009-09-01), Tsutsumi et al.
patent: 2008/0036990 (2008-02-01), Hirai et al.
patent: 2008/0062395 (2008-03-01), Yoshimura
patent: 2009/0042115 (2009-02-01), Inoue et al.
patent: 2010/0002218 (2010-01-01), Kosugi
patent: 09-045608 (1997-02-01), None

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