Radiation imagery chemistry: process – composition – or product th – Electric or magnetic imagery – e.g. – xerography,... – Post imaging process – finishing – or perfecting composition...
Reexamination Certificate
2007-07-20
2011-10-04
Chea, Thorl (Department: 1721)
Radiation imagery chemistry: process, composition, or product th
Electric or magnetic imagery, e.g., xerography,...
Post imaging process, finishing, or perfecting composition...
C430S005000, C430S117300, C430S119600
Reexamination Certificate
active
08029964
ABSTRACT:
A polymer-based pattern mask system and methods of masking and patterning a substrate employ an organosilane to enhance adhesion between a pattern mask and the substrate. The substrate is compatible with the organosilane. The methods include applying a coating of the organosilane to a substrate surface and printing a pattern mask on the coated surface using a roll-to-roll printing process. The pattern mask is polymer-based. The organosilane enhances adhesion during printing of the pattern mask. The method of patterning further includes patterning the substrate surface and lifting-off the pattern mask. The organosilane further enhances adhesion during patterning and does not hinder lifting-off the pattern mask. The system includes the pattern mask, the organosilane and a lift-off agent to remove the pattern mask.
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Almanza-Workman A. Marcia
Taussig Carl P.
Chea Thorl
Hewlett--Packard Development Company, L.P.
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