Polymer thin film, patterned substrate, patterned medium for...

Details Polymer thin film, patterned substrate, patterned medium for... Polymer thin film, patterned substrate, patterned medium for...

2008-01-25

2011-10-18

Bernatz, Kevin M. (Department: 1785)

Coating processes

Nonuniform coating

Applying superposed diverse coatings or coating a coated base

C428S848800, C428S339000, C428S220000, C428S847000, C427S374200, C427S388200

Reexamination Certificate

active

08039056

ABSTRACT:
A polymer thin film in which cylindrical phases are distributed in a continuous phase and are oriented in a pass-through-direction of the film includes at least: a first block copolymer including at least a block chain A1, as a component of the continuous phase, composed of polymerized monomers a1, and a block chain B1, as a component of the cylindrical phases, composed of polymerized monomers b1; and a second block copolymer including at least a block chain A2, as a component of the continuous phase, composed of polymerized monomers a2, and a block chain B2, as a component of the cylindrical phases, composed of polymerized monomers b2, with the second copolymer having a degree of polymerization different from that of the first copolymer. A film thickness of the polymer thin film and an average center distance between adjacent cylindrical phases have a relation represented by a predetermined expression.

REFERENCES:
patent: 2002/0055239 (2002-05-01), Tuominen et al.
patent: 2002/0135880 (2002-09-01), Fink et al.
patent: 2003/0118800 (2003-06-01), Thomas et al.
patent: 2004/0143063 (2004-07-01), Chen et al.
patent: 2006/0231525 (2006-10-01), Asakawa et al.
patent: 2008/0290067 (2008-11-01), Yoshida et al.
Ryu et al; Science, vol. 308 pp. 236-239; Apr. 8, 2005.
Park et al; Polymer, vol. 44, Apr. 2003 p. 6725-6760.
Fasolka et al; Macromolecules, Jun. 29, 2000, p. 5702-5712.

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