Method of correcting a mask pattern and method of...

Details Method of correcting a mask pattern and method of... Method of correcting a mask pattern and method of...

2008-03-21

2011-11-22

Rosasco, Stephen (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S311000

Reexamination Certificate

active

08062810

ABSTRACT:
The method of manufacturing a semiconductor device has deciding an amount of a correction of a mask pattern for a size of an active region of a semiconductor substrate, correcting the mask pattern on the basis of the decided amount of the correction, and exposing a resist film by using an exposure mask having the corrected mask pattern.

REFERENCES:
patent: 6136478 (2000-10-01), Usui et al.
patent: 6665858 (2003-12-01), Miyazaki
patent: 7103870 (2006-09-01), Misaka et al.
patent: 7638244 (2009-12-01), Kanai
patent: 2001-133956 (2001-05-01), None
patent: 2002-174890 (2002-06-01), None

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