Method for correcting a mask pattern, system for correcting...

Details Method for correcting a mask pattern, system for correcting... Method for correcting a mask pattern, system for correcting...

2009-02-11

2011-10-25

Whitmore, Stacy (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Design of semiconductor mask or reticle

C430S016000, C257SE21530

Reexamination Certificate

active

08046722

ABSTRACT:
A computer implemented method for correcting a mask pattern includes: predicting a displacement of a device pattern by using a mask pattern to form the device pattern and a variation of a process condition; determinating an optical proximity correction value so that the displacement falls within a displacement tolerance of the device pattern; and correcting the mask pattern using the optical proximity correction value.

REFERENCES:
patent: 6453274 (2002-09-01), Kamon
patent: 6567972 (2003-05-01), Tanaka et al.
patent: 2003/0162105 (2003-08-01), Nojima et al.
patent: 2000-260706 (2000-09-01), None
patent: 2002-72442 (2002-03-01), None
patent: 2002-131882 (2002-05-01), None
patent: 2004-163756 (2004-06-01), None
patent: 2004-184633 (2004-07-01), None
Notification of Reasons for Refusal issued by the Japanese Patent Office on Nov. 24, 2010, for Japanese Patent Application No. 2004-238366, and English-language translation thereof.

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