Photomask and method of forming overlay vernier of...

Details Photomask and method of forming overlay vernier of... Photomask and method of forming overlay vernier of...

2008-06-05

2011-10-25

Rosasco, Stephen (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S313000

Reexamination Certificate

active

08043770

ABSTRACT:
This patent relates to a photomask and a method of forming an overlay vernier of a semiconductor device employing the same. The photomask includes a reticle formed of a first material through which light can transmit, a first pattern formed on the reticle and formed of a material through which light cannot transmit, a second pattern having a size smaller than the first pattern, and an auxiliary pattern formed to come in contact with the first pattern and formed of a second material different from the first material of the reticle. Thus, inclination is formed on side portions of the overlay vernier and a thin film may be easily formed on the overlay vernier.

REFERENCES:
patent: 5543252 (1996-08-01), Shibata et al.
patent: 2003/0064297 (2003-04-01), Shiota et al.
patent: 2006/0240359 (2006-10-01), Liu
patent: 2006/0251971 (2006-11-01), Schenker
patent: 2007/0072091 (2007-03-01), Smith et al.
patent: 2007/0212650 (2007-09-01), Sim
patent: 2008/0160261 (2008-07-01), Kim
patent: 10-2006-0135156 (2006-12-01), None

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