Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2009-09-08
2011-10-04
Hassanzadeh, Parviz (Department: 1716)
Coating apparatus
Gas or vapor deposition
With treating means
C118S7230ER, C118S7230ER, C118S7230AN, C118S7230ME, C156S345430, C156S345440, C156S345450, C156S345460, C156S345470, C315S111210
Reexamination Certificate
active
08028654
ABSTRACT:
An apparatus and method for initiating a process gas plasma. A conductive plate having a plurality of conductive fingers is positioned in a microwave applicator. An arc forms between the conductive fingers to initiate the formation of a plasma. A transport mechanism may convey process materials through the plasma. A spray port may be provided to expel processed materials.
REFERENCES:
patent: 5120568 (1992-06-01), Schuurmans et al.
patent: 5234723 (1993-08-01), Babacz
patent: 5270616 (1993-12-01), Itatani
patent: 5273587 (1993-12-01), Guha et al.
patent: 5603771 (1997-02-01), Seiberras et al.
patent: 5620743 (1997-04-01), Harth et al.
patent: 5637150 (1997-06-01), Wartski et al.
patent: 6158383 (2000-12-01), Watanabe et al.
patent: 6204606 (2001-03-01), Spence et al.
patent: 6246175 (2001-06-01), Kou et al.
patent: 6401653 (2002-06-01), Taniguchi et al.
patent: 6437512 (2002-08-01), Chen et al.
patent: 6525481 (2003-02-01), Klima et al.
patent: 6607633 (2003-08-01), Noguchi
patent: 6666923 (2003-12-01), Jeong et al.
patent: 6667577 (2003-12-01), Shannon et al.
patent: 6675737 (2004-01-01), Hongoh et al.
patent: 6726802 (2004-04-01), Tadera et al.
patent: 6729261 (2004-05-01), Hongo
patent: 6764658 (2004-07-01), Denes et al.
patent: 6998565 (2006-02-01), Shinohara
patent: 7262500 (2007-08-01), Sakamoto et al.
patent: 2001/0018127 (2001-08-01), David et al.
patent: 2002/0002948 (2002-01-01), Hongo et al.
patent: 2002/0179564 (2002-12-01), Geobegan et al.
patent: 2003/0106643 (2003-06-01), Tabuchi et al.
patent: 2003/0139005 (2003-07-01), Song et al.
patent: 2003/0168012 (2003-09-01), Tamura et al.
patent: 2005/0115933 (2005-06-01), Kong et al.
patent: 2005/0271829 (2005-12-01), Kumar et al.
patent: 2006/0065195 (2006-03-01), Nagatsu
patent: 1377138 (2004-01-01), None
patent: 02-170978 (1990-07-01), None
patent: 07-263187 (1995-10-01), None
Naudin, Jean-Louis, “Plasmoid (Ball Lightning) Generation with a Microwave Resonator” http://jlnlabs.online.fr/plasma/4wres/index.htm, Original publication date unknown (9 pages).
Morrell Jonathan S.
Ripley Edward B.
Seals Roland D.
Babcock & Wilcox Technical Services Y-12, LLC
Dhingra Rakesh K
Hassanzadeh Parviz
Luedeka Neely & Graham P.C.
LandOfFree
Planar controlled zone microwave plasma system does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Planar controlled zone microwave plasma system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Planar controlled zone microwave plasma system will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4279008