Electric heating – Metal heating – By arc
Reexamination Certificate
2007-09-11
2011-11-15
Paschall, Mark (Department: 3742)
Electric heating
Metal heating
By arc
C219S121580, C219S121520, C118S7230IR, C156S345340, C156S345510
Reexamination Certificate
active
08058586
ABSTRACT:
A plasma treatment apparatus that can perform an excellent plasma treatment on a portion of a work which is to be used for producing products or parts, while preventing undesirable occurrence of discharge at that portion reliably is provided. The plasma treatment apparatus performs a plasma treatment on a plate-shaped work having an usable region to be used for producing products or parts and an unusable region other than the usable region. The plasma treatment apparatus includes a first electrode, a second electrode provided so as to face the first electrode via the work so that a space is formed between the second electrode and the work, a gas supply unit which supplies a gas into the space, a power circuit having a power source which applies a high frequency voltage across the first and second electrodes so that the gas supplied into the space is converted into a plasma, and a support unit which supports at least a part of the second region of the work so that the work is spaced apart from the first electrode in a distance at which discharge does not occur between the first region and the first electrode when the high frequency voltage is applied across the first and second electrodes. A plasma treatment method performed using such a plasma treatment apparatus is also provided.
REFERENCES:
patent: 06-244175 (1994-09-01), None
patent: 07-211769 (1995-08-01), None
patent: 2004-158563 (2004-06-01), None
patent: 2002-0033441 (2002-05-01), None
Taiwanese IPO; Office Action in foreign application (TW 094124985) to which priority is claimed by the present application; Aug. 8, 2008.
Paschall Mark
Seiko Epson Corporation
LandOfFree
Plasma treatment apparatus and plasma treatment method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Plasma treatment apparatus and plasma treatment method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Plasma treatment apparatus and plasma treatment method will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4278872